The TubeStar furnace platform is a compact batch type tube furnace. This platform is dedicated to diffusion, oxidation and deposition applications and has been designed to meet the needs of process engineering. The TubeStar range is modular and flexible. Indeed, it can be made of 1 to 4 independent tubes, with a capacity of 50 wafers per tube.
Tube furnace - Tubestar
Tubestar Batch type tube furnace for R&D & small scale production
The TubeStar furnace platform excels in the processing of small quantities of wafers, but also fits well with the treatment of large batches thanks to its flexibility. These have proven their efficiency during the qualification of process changes such as in PV manufacturing lines.
One of the key characteristics of this tube furnace lies in precision heat treatment combined with high levels of tuning flexibility. This allows a wide spectrum of applications.
- Diffusion
- LPCVD
- Oxidation
Tubestar
- 100mm
- 200mm
- 300mm
- Atmospheric configuration
- Primary vacuum pump
- Secondary vacuum pump
- LPCVD configuration
- Process gas line
- Wet oxidation
- By-product treatment systems
